System and method for seaming high-modulus, high-tenacity, low-elongation fabrics
AssigneeLockheed Martin Corporation
InventorsJohn F. BREWER, Dhiraj H. Darjee, David R. Dingler
Life of this patent
Estimating the term…
Abstract
A seaming system for forming a seam is disclosed, wherein the seam consists of at least two opposed sections of high-modulus, high-tenacity, low-elongation fabric sections joined by a tape. The system comprises a seamer head, and a seamer base that includes a topography configured to impart a predetermined pressure gradient to the adhesive layer, tape, and fabric sections of the seam. The resultant seam has a cross-section or thickness profile that generally corresponds to that of the applied pressure gradient. As such, the constructed seam more efficiently distributes stress imparted from any applied load.
Claims11
A seaming system to form a seam comprising:
- a seamer head;
- a seamer base spaced apart from said seamer head and forming an opening therebetween, wherein said seamer base comprises a topography;
- and
- at least one backing layer disposed adjacent said seamer base;
- wherein said seamer head and said seamer base are movable relative to each other so as to apply pressure to a seam placed in said opening.
(canceled)
Dependencies are inferred from the claim text.