Dosimetry implant for treating restenosis and hyperplasia
AssigneeSnIP Holdings, Inc.
InventorsSuresh Srivastava, Gilbert R. Gonzales, Roger W. Howell, Wesley E. Bolch, Radoslav Adzic
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Abstract
The present invention discloses a method of selectively providing radiation dosimetry to a subject in need of such treatment. The radiation is applied by an implant comprising a body member and 117mSn electroplated at selected locations of the body member, emitting conversion electrons absorbed immediately adjacent selected locations while not affecting surrounding tissue outside of the immediately adjacent area.
Claims16
An implant comprising a body member and a conversion electron emitting source (CEES) associated with selected locations of the body member, with the CEES providing conversion electrons that are emitted to provide radiation dosimetry immediately adjacent the selected locations while not affecting surrounding tissue outside of the immediately adjacent area.
Dependencies are inferred from the claim text.