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US 2010/0136767 A1Published application
Method for production of thin film and apparatus for manufacturing the same
AssigneeSnu R&Db Foundation
InventorsNong Moon Hwang, Yung Bin Chung, Dong Kwon Lee
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Abstract
A method for manufacturing a thin film is provided. A substrate is loaded into a chamber. A first reaction gas and a second reaction gas are supplied into the chamber. The first reaction gas is dissociated to form crystalline nanoparticles. An amorphous material is inhibited from being formed on the substrate using the second reaction gas. Thereafter, a crystalline thin film is formed from the crystalline nanoparticles provided on the substrate.
Claims22
A method of manufacturing a thin film, comprising:
- (a) loading a substrate into a chamber;
- (b) supplying a first reaction gas and a second reaction gas into the chamber;
- (c) dissociating the first reaction gas to form crystalline nanoparticles;
- (d) inhibiting an amorphous material from being formed on the substrate using the second reaction gas;
- and
- (e) forming a crystalline thin film from the crystalline nanoparticles provided on the substrate.
3 more elements
An apparatus for manufacturing a thin film, comprising:
- a chamber into which a substrate is loaded;
- a first gas supplier configured to supply a first reaction gas into the chamber;
- an energy source configured to dissociate the first reaction gas to form crystalline nanoparticles;
- and
- a second gas supplier configured to supply a second reaction gas used to inhibit an amorphous material from being formed on the substrate.
2 more elements
Dependencies are inferred from the claim text.