Acetal compounds and their preparation, polymers, resist compositions and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKoji HASEGAWA, Masaki Ohashi, Takeshi Kinsho, Tsunehiro Nishi, Masayoshi Sagehashi
Life of this patent
Estimating the term…
Abstract
An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or a divalent C1-C4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.
Claims9
An acetal compound having the general formula (1):
- wherein R1 is hydrogen, methyl or trifluoromethyl, R2 is a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R3 and R4 are each independently hydrogen or a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R2 and R3 may bond together to form an aliphatic hydrocarbon ring with the carbon atoms to which they are attached, and X1 is a single bond or a straight or branched divalent C1-C4 hydrocarbon group.
A method for preparing a vinyl ether compound having the general formula (5), comprising the steps of etherifying an adamantane compound having the general formula (2) and an alkenyl compound having the general formula (3) to form an allyl ether compound having the general formula (4) and isomerizing the double bond in the allyl ether compound,
- wherein R2 is a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R3 and R4 are each independently hydrogen or a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R2 and R3 may bond together to form an aliphatic hydrocarbon ring with the carbon atoms to which they are attached, X1 is a single bond or a straight or branched divalent C1-C4 hydrocarbon group, T1 and T2 are each independently a hydroxyl group, halogen atom, alkanesulfonyloxy or arenesulfonyloxy group.
A polymer comprising recurring units of the general formula (8):
- wherein R1 is hydrogen, methyl or trifluoromethyl, R2 is a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R3 and R4 are each independently hydrogen or a straight, branched or cyclic monovalent C1-C10 hydrocarbon group, R2 and R3 may bond together to form an aliphatic hydrocarbon ring with the carbon atoms to which they are attached, and X1 is a single bond or a straight or branched divalent C1-C4 hydrocarbon group.
Dependencies are inferred from the claim text.