Photosensitive Composition
OwnerEdward W. Ng, Nelson M. Felix +2inventors
InventorsEdward W. Ng, Nelson M. Felix, Munirathna Padmanaban, Srinivasan Chakrapani
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Abstract
The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1), and c) optionally a photoacid generator, (+A1−O2C)—B—(CO2−A2+)x (1) where A1+ and A2+ are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition.
Claims20
A photosensitive composition sensitive to exposure radiation comprising a) an organic polymer b) a photobase generator of structure (1), and c) optionally a photoacid generator
- (+A1−O2C)—B—(CO2−A2+)x (1)
- where A1+ and A2+ are independently an onium cation, x is greater than or equal to 1, and B is a nonfluorinated organic moiety.
Dependencies are inferred from the claim text.