Substrate processing apparatus

A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, comprising the steps of:

• forming a photosensitive film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device;
• applying washing processing to the substrate by supplying a washing liquid to the substrate in said second processing unit after the formation of said photosensitive film by said first processing unit and before the exposure processing by said exposure device;
• applying drying processing to the substrate in said second processing unit after the washing processing by said second processing unit and before the exposure processing by said exposure device and
• applying development processing to the substrate by said third processing unit after the exposure processing by said exposure device,
• wherein said step of applying the drying processing to the substrate includes the step of supplying an inert gas onto the substrate, to which the washing liquid is supplied.