Solvent for cleaning of organic thin film

Abstract

It is to provide a cleaning solvent capable of forming a thin film with little falling off of the film component. It is a solvent for cleaning an organic thin film having a solubility of 100 to 400 mg/g at 25° C. for a polymer obtained by subjecting n-octadecyltrimethoxysilane to a hydrolytic polycondensation with KOH. The solvent is preferably an aromatic hydrocarbon solvent comprising at least one compound represented by the formula (I) (wherein each R may be the same or different and represents C1-C18 alkyl group, and n represents 2, 3 or 4), where diethylbenzene or Solvesso (registered trademark) is particularly preferred.

Dependencies are inferred from the claim text.