Source Mask Optimization For Microcircuit design

A computer program product for performing source mask optimization comprising:

• software instructions for enabling the computer to perform a set of predetermined operations;
• and
• at least one computer readable medium bearing the software instructions;
• the set of predetermined operations including:
• forming a representation of an intensity of radiation at various points on a wafer;
• optimizing on the computer the representation of intensity of radiation;
• generating on the computer a source illuminator profile for use in the lithographic process based in part upon the optimization;
• saving the source illuminator profile to a memory storage location.
• generating on the computer a continuous tone mask based in part upon the optimization and the source illuminator profile;
• saving the continuous tone mask to a memory storage location;
• optimizing on the computer the source illuminator profile and the continuous tone mask;
• and
• saving the optimized source illuminator profile and the optimized continuous tone mask to a memory storage location.

A source illuminator profile and mask design generated by a method comprising:

• forming a representation of an intensity of radiation at various points on a wafer;
• optimizing on the computer the representation of intensity of radiation;
• generating on the computer a source illuminator profile for use in the lithographic process based in part upon the optimization;
• saving the source illuminator profile to a memory storage location.
• generating on the computer a continuous tone mask based in part upon the optimization and the source illuminator profile;
• saving the continuous tone mask to a memory storage location;
• optimizing on the computer the source illuminator profile and the continuous tone mask;
• and
• saving the optimized source illuminator profile and the optimized continuous tone mask to a memory storage location.