Microlithography projection optical system and method for manufacturing a device
AssigneeCarl Zeiss SMT GmbH
InventorsHans-Juergen Mann, Wilhelm Ulrich
Life of this patent
Estimating the term…
Abstract
In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.
Claims27
A system, comprising:
- a plurality of reflective elements configured to image radiation from an object field in an object plane of the system to an image field in an image plane of the system,
- wherein:
- the system has an optical axis that is a common axis of rotational symmetry for each reflective element in the projection objective system;
- d=h(1−M);
- h is a distance of a central point of the object field from the optical axis in a direction perpendicular to the optical axis;
- M is a magnification ratio of the optical system;
- d is about 75 mm or less;
- the image field has a size of at least 1 mm×1 mm;
- the system is a catoptric microlithography projection optical system;
- and
- the system has an image-side numerical aperture of about 0.2 or more.
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A tool, comprising:
- an illumination system comprising one or more optical elements;
- and
- a catoptric microlithography projection optical system, comprising:
- a plurality of reflective elements configured to image radiation from an object field in an object plane of the catoptric microlithography projection optical system to an image field in an image plane of the catoptric microlithography projection optical system,
- wherein:
- the catoptric microlithography projection optical system has an optical axis that is a common axis of rotational symmetry for each reflective element in the projection objective system;
- d=h(1−M);
- h is a distance of a central point of the object field from the optical axis in a direction perpendicular to the optical axis;
- M is a magnification ratio of the optical system;
- d is about 75 mm or less;
- the image field has a size of at least 1 mm×1 mm;
- the catoptric microlithography projection optical system has an image-side numerical aperture of about 0.2 or more;
- and
- the tool is a microlithography tool.
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Dependencies are inferred from the claim text.