Shape measurement apparatus and shape measurement method
AssigneeKobelco Research Institute, Inc.
InventorsMasaru Akamatsu, Hidehisa Hashizume, Yasuhide Nakai
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AssigneeKobelco Research Institute, Inc.
InventorsMasaru Akamatsu, Hidehisa Hashizume, Yasuhide Nakai
Estimating the term…
To provide a shape measurement apparatus and a shape measurement method with which it is possible to perform a shape measurement, when a shape of an end surface of a disk-shaped semiconductor wafer or the like is measured on the basis of a projection image thereof, without receiving an influence of a contaminant on the end surface. With a rotation supporting mechanism 9 supporting a wafer 1, the wafer 1 is supported in a range from a first supporting position rotated by +δ with respect to a predetermined reference supporting position to a second supporting position rotated by −δ degrees at two or more supporting positions including the first supporting position and the second supporting position, a projection image of the end surface of the wafer 1 supported at the respective supporting positions is picked up by an image sensor 7, an index value of an end surface value is calculated for each of a plurality of obtained projection images, a selection of one representative value based on the plurality of calculated index values or a calculation of one aggregate value is performed, and a measurement value for the shape of the end surface of the wafer 1 corresponding to the reference supporting position is derived. At that time, when a radius of the wafer 1 and a chamfer width are set as r and k, δ≧cos−1 ((r−k)/r) is desirably satisfied.
A shape measurement apparatus comprising:
A shape measurement method comprising:
Dependencies are inferred from the claim text.