Curable composition for photoimprint, and method for producing cured product using same
AssigneeFUJIFILM Corporation
InventorsHiroyuki Yonezawa, Takashi Takayanagi, Kyouhei Sakita
Life of this patent
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Abstract
A curable composition for photoimprints containing a photopolymerizable monomer and a photopolymerization initiator, wherein the proportion of the compound having a molecular weight of at most 190 in the composition is at most 20% by mass, and the viscosity of the composition is from 3 to 50 mPa·s at 25° C., is excellent in patterning accuracy.
Claims20
A curable composition for photoimprints containing a photopolymerizable monomer (A) and a photopolymerization initiator (B), wherein the proportion of the compound having a molecular weight of at most 190 in the composition is at most 20% by mass, and the viscosity of the composition is from 3 to 50 mPa·s at 25° C.
Dependencies are inferred from the claim text.