Image sensors and methods of manufacturing the same

A method of manufacturing an image sensor, the method comprising:

• first etching a first region where a plurality of metal layers and a plurality of metal lines are formed;
• second etching a second region where the plurality of metal layers are formed;
• and
• forming the plurality of metal layers and the plurality of metal lines in the first and second regions;
• wherein
• each of the plurality of metal layers is formed below a respective one of the plurality of photodiodes, and
• the plurality of metal layers are configured to receive a bias voltage.

A method of manufacturing an image sensor, the method comprising:

• forming a plurality of metal layers, each of the plurality of metal layers being formed to correspond to one of a plurality of photodiodes;
• forming a plurality of contacts for supplying electric power to the plurality of metal layers;
• and
• forming a plurality of interconnecting metal lines;
• wherein
• each of the plurality of metal layers are formed below a corresponding one of the plurality of photodiodes, and
• the plurality of metal layers are configured to receive a bias voltage.

An image sensor comprising:

• a plurality of photodiodes;
• a plurality of wells isolating the plurality of photodiodes from each other;
• and
• a plurality of conductive lines, each of the plurality of conductive lines being formed above a corresponding one of the plurality of photodiodes and a well adjacent to the photodiode, the plurality of conductive lines being configured to receive a bias voltage.