Ion implantation apparatus, substrate clamping mechanism, and ion implantation method
AssigneeFujitsu Microelectronics Limited
InventorHidenori Takahashi
Life of this patent
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Abstract
Provided is an ion implantation apparatus including a disk which rotates about a first axis, a pad which is rotatable about a second axis on the disk, and on which a substrate is placed with a holder attached to a circumference of the substrate, the holder including a weight, fixing pins which are each fixedly provided on a portion on the disk around the pad, a sliding piece which slides, by its own centrifugal force, on the disk with a rotational movement of the disk and thereby clamps the holder in cooperation with the fixing pins, and an ion beam generator which irradiates the substrate with ion beams.
Claims16
An ion implantation apparatus comprising:
- a disk which rotates about a first axis;
- a pad which is rotatable about a second axis on the disk, and on which a substrate is placed with a holder attached to a circumference of the substrate, the holder including a weight;
- a fixing piece which is fixedly provided on a portion of the disk around the pad;
- a fixing piece which is fixedly provided to a portion of the disk around the pad;
- a sliding piece which slides, by its own centrifugal force, on the disk by a rotational movement of the disk and thereby clamps the holder in cooperation with the fixing piece;
- and
- an ion beam generator which irradiates the substrate with an ion beam.
A substrate clamping mechanism comprising:
- a pad which is provided rotatably about a second axis on a disk configured to rotate about a first axis, and on which a substrate is placed with a holder attached to a circumference of the substrate, the holder including a weight;
- a fixing piece which is fixedly provided to a portion of the disk around the pad;
- and
- a sliding piece which slides, by its own centrifugal force, on the disk by a rotational movement of the disk and thereby clamps the holder in cooperation with the fixing piece.
An ion implantation method comprising:
- placing a substrate on a rotatable pad on a disk with a holder attached to a circumference of the substrate, the holder including a weight;
- pressing a sliding piece provided on the disk against the holder by a centrifugal force of the sliding piece by a rotation of the disk, and thereby clamping the holder by the sliding piece and a fixing piece fixedly provided on the disk;
- and,
- after the clamping, irradiating the substrate with an ion beam while rotating the disk.
Dependencies are inferred from the claim text.