Unit for supplying treating liquid, and apparatus and method for treating substrate using the same

Abstract

Provided are a treating liquid supplying unit, and a substrate processing apparatus and method using the same. Temperature of treating liquid in a treating liquid pipe built into a nozzle arm can be maintained, through heat transfer between the nozzle arm and a standby port and heat transfer between the nozzle arm and a nozzle moving unit, while the nozzle arm is standing by in standby position, while processing is being performed at a processing position, and during movement between the standby position and a processing position. Thus, treating liquid supplied from a nozzle can be maintained at a predetermined temperature by the treating liquid supplying unit, and the substrate processing apparatus and method using the same.

Dependencies are inferred from the claim text.