Processing method and processing system

A method for processing a workpiece, comprising:

• a surface structure measurement step of measuring using Scatterometry a dimension of a surface structure of the workpiece before an etching processing;
• a processing condition setting step of setting a processing condition at the time of an etching processing based on the measurement result of the dimension of the surface structure so that the surface structure of the workpiece after the etching processing has a desired dimension;
• and
• thereafter, an etching step of performing an etching processing for the workpiece under the set processing condition,
• wherein correlation data between the processing condition at the time of the etching processing and an elimination amount of the surface structure of the workpiece by the etching processing is obtained in advance;
• and
• wherein said processing condition setting step sets the processing condition based on the measurement result of the dimension of the surface structure and the correlation data.