Substrate processing apparatus
AssigneeSokudo Co., Ltd.
InventorsKoji Kaneyama, Kazuhito Shigemori, Akiko Harumoto, Tadashi Miyagi
Life of this patent
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Abstract
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. These blocks are arranged in the substrate processing apparatus in the above order. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. A hydrophobic processing unit is arranged in the resist cover film processing block and applies hydrophobic processing to the substrate before exposure processing.
Claims14
A substrate processing method of processing a substrate using a substrate processing apparatus that is arranged adjacent to an exposure device, comprising the steps of:
- forming a photosensitive film made of a photosensitive material on the substrate by said substrate processing apparatus;
- applying hydrophobic processing to the substrate after formation of said photosensitive film by said substrate processing apparatus;
- carrying the substrate after the hydrophobic processing from said substrate processing apparatus into said exposure device;
- carrying the substrate after exposure processing by said exposure device out of said exposure device to said substrate processing apparatus;
- and
- applying processing after the exposure processing to the substrate by said substrate processing apparatus.
Dependencies are inferred from the claim text.