New Cleaning, Descaling and Disinfecting Composition for Dialysis Generators

A composition comprising, per 100% of its mass:

• from 0.50 wt % to 1.50 wt % of peracetic acid;
• from 3.00 wt % to 15.00 wt % of hydrogen peroxide;
• from 3.00 wt % to 15.00 wt % of acetic acid;
• from 0.10 wt % to 1.00 wt % of concentrated nitric acid;
• from 0.001 wt % to 0.20 wt % of non-ionic surfactant;
• from 0.01 wt % to 0.10 wt % of amine oxide;
• from 0.01 wt % to 0.20 wt % of stabilizer;
• and
• water to make it up to 100 wt %.

A method for preparing a composition comprising, per 100% of its mass:

• from 0.50 wt % to 1.50 wt % of peracetic acid;
• from 3.00 wt % to 15.00 wt % of hydrogen peroxide;
• from 3.00 wt % to 15.00 wt % of acetic acid;
• from 0.10 wt % to 1.00 wt % of concentrated nitric acid;
• from 0.001 wt % to 0.20 wt % of non-ionic surfactant;
• from 0.01 wt % to 0.10 wt % of amine oxide;
• from 0.01 wt % to 0.20 wt % of stabilizer;
• and
• water to make it up to 100 wt %;
• said method comprising a step of mixing, per 100 wt %, from 3 wt % to 20 wt % of an aqueous solution (A) that comprises from 5 wt % to 30 wt % of peracetic acid, from 10 wt % to 50 wt % of hydrogen peroxide, from 5 wt % to 60 wt % of acetic acid, optionally up to 1% of stabilizer, and water to make the aqueous solution (A) up to 100 wt %, with from 80 vol % to 97 vol % of an aqueous solution (B) prepared by mixing, per 100 wt % from 8 wt % to 10 wt % of acetic acid, from 0.10 wt % to 1 wt % of nitric acid, from 3 wt % to 10 wt % of hydrogen peroxide, from 0.03 wt % to 0.1 wt % of non-ionic surfactant, from 0.01 wt % to 0.1 wt % of amine oxide, from 0.005 wt % to 0.1 wt % of stabilizer;
• and water to make the aqueous solution (B) up to 100 wt %.

A method of cleaning, descaling and disinfecting the hydraulic circuits of the dialysis generator between two dialysis sessions, wherein the method comprises the steps of:

• (a) circulating an aqueous solution obtained by the dilution of a composition comprising, per 100% of its mass:
• from 0.50 wt % to 1.50 wt % of peracetic acid;
• from 3.00 wt % to 15.00 wt % of hydrogen peroxide;
• from 3.00 wt % to 15.00 wt % of acetic acid;
• from 0.10 wt % to 1.00 wt % of concentrated nitric acid;
• from 0.001 wt % to 0.20 wt % of non-ionic surfactant;
• from 0.01 wt % to 0.10 wt % of amine oxide;
• from 0.01 wt % to 0.20 wt % of stabilizer;
• and
• water to make it up to 100 wt %,
• within the hydraulic circuits of the dialysis generator for a period of time between 10 minutes and 30 minutes, the dilution of the composition being between 1/20 and 1/40 in water osmosed by the generator,
• and at the end of step (a);
• (b) rinsing for a time between 15 minutes and 60 minutes, the rinsing consisting of the circulation of osmosed water within the hydraulic circuits of the dialysis generator.

A method for cleaning, descaling and disinfecting the distribution loop of a water treatment line for hemodialysis, wherein the method comprises the steps of:

• (a) circulating an aqueous solution obtained by the dilution of a composition comprising, per 100% of its mass:
• from 0.50 wt % to 1.50 wt % of peracetic acid;
• from 3.00 wt % to 15.00 wt % of hydrogen peroxide;
• from 3.00 wt % to 15.00 wt % of acetic acid;
• from 0.10 wt % to 1.00 wt % of concentrated nitric acid;
• from 0.001 wt % to 0.20 wt % of non-ionic surfactant;
• from 0.01 wt % to 0.10 wt % of amine oxide;
• from 0.01 wt % to 0.20 wt % of stabilizer;
• and
• water to make it up to 100 wt %,
• within the distribution loop for a period of time between 30 minutes and 60 minutes, the dilution of the composition being between 1/20 and 1/40 in water,
• and at the end of step (a);
• (b) rinsing for a time between 30 minutes and 60 minutes, the rinsing consisting of the circulation of osmosed water within the distribution loop.

The use of a composition comprising, per 100% of its mass:

• from 0.50 wt % to 1.50 wt % of peracetic acid;
• from 3.00 wt % to 15.00 wt % of hydrogen peroxide;
• from 3.00 wt % to 15.00 wt % of acetic acid;
• from 0.10 wt % to 1.00 wt % of concentrated nitric acid;
• from 0.001 wt % to 0.20 wt % of non-ionic surfactant;
• from 0.01 wt % to 0.10 wt % of amine oxide;
• from 0.01 wt % to 0.20 wt % of stabilizer;
• and
• water to make it up to 100 wt %.
• for cleaning, descaling and disinfecting dialysis equipment between two successive dialysis sessions, without the need for supplementary treatment other than a rinsing of the dialysis equipment with osmosed water.