Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device

A method for manufacturing a photoelectric conversion device, comprising:

• sending a substrate from a roller for sending a substrate, which is provided in a first transfer chamber;
• forming a first semiconductor film over the substrate by making the substrate pass through a first discharging electrode provided in a first film formation chamber;
• transferring the substrate on which the first semiconductor film is formed through a first slit provided in a first buffer chamber;
• forming a second semiconductor film over the first semiconductor film by making the substrate pass through a second discharging electrode provided in a second film formation chamber;
• transferring the substrate on which the second semiconductor film is formed through a second slit provided in a second buffer chamber;
• forming a third semiconductor film having opposite conductivity to the first semiconductor film over the second semiconductor film by making the substrate pass through a third discharging electrode provided in a third film formation chamber;
• and
• rewinding the substrate over which the first to third semiconductor films are faulted by a roller for rewinding a substrate, which is provided in a second transfer chamber,
• wherein each of the first slit and the second slit is provided with at least one touch roller, and the touch roller is in contact with a surface of the substrate on which the semiconductor film is formed.