Method for manufacturing a thin film structure

A method for manufacturing a fringe field switching type liquid crystal display array substrate, the array substrate comprising display regions and non-display regions, the non-display regions comprising a wiring region and a thin film transistor (TFT) region located between the display regions, the wiring region comprising gate lines region and common electrode region, and the method comprising the following steps:

• Step 1:
• providing a substrate having a first recess and a second recess formed in an upper surface thereof, the first recess being deeper than the second recess, the first recess corresponding to the gate line region and the TFT region, and the second recess corresponding to the common electrode region;
• Step 2:
• depositing a transparent conductive layer and a gate metal layer of different thicknesses successively on the substrate;
• and
• Step 3:
• grinding the substrate subjected to the Step 2 so that the upper surface is made flat and the transparent conductive layer and the gate metal layer are remained in the first recess while only the transparent conductive layer is remained in the second recess.