Methods for Manufacturing a Contact Grid on a Photovoltaic Cell

A process for fabricating a contact grid for a photovoltaic cell, the process comprising:

• providing a photovoltaic cell having an antireflective coating disposed on a sun facing side, the photovoltaic cell comprising a silicon substrate having a p-n junction;
• stamping a pattern of a photoresist and/or polymer onto the antireflective coating;
• curing the photoresist and/or polymer;
• etching the pattern in the antireflective coating to form openings that define the contact grid;
• stripping the UV sensitive photoresist and/or polymer;
• stamping an aluminum based metal paste into the openings of the pattern by dipping a stamp into the aluminum based metal paste, wherein the stamp comprises a plurality of projections corresponding to the openings having a diameter and/or width smaller than the openings;
• stamping the projections into the openings;
• and filling the openings with the metal paste;
• and
• annealing the aluminum based metal paste.