Mold for optical element, having nanostructure, mold for nanostructure, method for manufacturing the mold, and optical element

A mold for an optical element having a nanostructure, which is manufactured by the method for manufacturing a mold for an optical element, comprising:

• forming at least one etching transfer layer on the substrate, and forming a thin film for island-shaped fine particle formation on the etching transfer layer;
• forming a plurality of island-shaped fine particles, by subjecting the thin film to any one of a thermal reaction, a photoreaction and a chemical reaction or to a combination reaction of these reactions thereby to cause any one of aggregation, decomposition, and nucleation functions of a material of the thin film;
• and
• forming a pattern with a high aspect ratio on the fine surface of the substrate, by successively etching the etching transfer layer and the substrate using the plurality of island-shaped fine particles as a protective mask.

A mold for a nanostructure, which is manufactured by the method for manufacturing a mold for a nanostructure, comprising:

• forming at least one etching transfer layer on the substrate, and forming a thin film for island-shaped fine particle formation on the etching transfer layer;
• forming a plurality of island-shaped fine particles, by subjecting the thin film to any one of a thermal reaction, a photoreaction and a chemical reaction or to a combination reaction of these reactions thereby to cause any one of aggregation, decomposition, and nucleation functions of a material of the thin film;
• and
• forming a pattern with a high aspect ratio on the fine surface of the substrate, by successively etching the etching transfer layer and the substrate using the plurality of island-shaped fine particles as a protective mask.