Sputtering target for optical media, method of manufacturing same, optical medium, and method of manufacturing same
AssigneeTDK Corporation
InventorsYukio Kawaguchi, Isamu Kuribayashi
Life of this patent
Estimating the term…
Abstract
A sputtering target for optical media is mainly composed of Al and contains 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag. An optical medium 100 comprises a substrate 10 and reflective layers 20A, 20B provided on the substrate 10. Each of the reflective layers 20A, 20B has a composition, mainly composed of Al, containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.
Claims9
A sputtering target for optical media, the sputtering target being mainly composed of Al and containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.
An optical medium comprising:
- a substrate;
- and
- a reflective layer provided on the substrate, the reflective layer being mainly composed of Al and containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.
A method of manufacturing an optical medium, the method comprising a step of forming a reflective layer by using a sputtering target being mainly composed of Al and containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.
A method of manufacturing a sputtering target for optical media, the method comprising a step of firing a material powder having a composition, mainly composed of Al, containing 1 to 10 at % of one or two species of elements selected from the group consisting of Ta and Nb and 0.1 to 10 at % of Ag.
Dependencies are inferred from the claim text.