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US 2010/0075033 A1Published application
Localized Linear Microwave Source Array Pumping to Control Localized Partial Pressure in Flat and 3 Dimensional PECVD Coatings
AssigneeApplied Materials, Inc.
InventorMichael W. Stowell
Life of this patent
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Abstract
A system and method for controlling deposition of thin films on substrates. One embodiment includes a vacuum chamber; a plurality of sources located inside the vacuum chamber; and a plurality of gas tubes, each of the plurality of gas tubes comprising a first volume for delivering precursor gas and a second volume for providing pumping.
Claims18
A vapor deposition system for depositing a film on a substrate, the system comprising:
- a vacuum chamber;
- a plurality of sources located inside the vacuum chamber;
- and
- a plurality of gas tubes, each of the plurality of gas tubes comprising a first volume for delivering precursor gas and a second volume for providing pumping.
1 more element
A vapor deposition system for depositing a film on a substrate, the system comprising:
- a vacuum chamber;
- a plurality of sources located inside the vacuum chamber;
- a plurality shields, each of the plurality of shields configured to partially surround a corresponding one of the plurality of sources;
- a plurality of carrier gas sources, each of the plurality of carrier gas sources positioned inside a corresponding one of the plurality of shields;
- a plurality of precursor gas sources;
- a top-side pumping vent, and
- a pump connected to the top-side pumping vent.
4 more elements
A method of operating a deposition system, the method comprising:
- supplying a precursor gas through a first volume in a gas tube;
- supplying a carrier gas through a carrier gas source;
- fractionalizing the precursor gas;
- depositing portions of the fractionalized precursor gas onto a substrate;
- and
- pumping waste portion of the carrier gas and the precursor gas away from the substrate through a second volume in the gas tube.
3 more elements
Dependencies are inferred from the claim text.