Hybrid optical switch apparatus
AssigneeNational Taiwan University
InventorsYao-Joe Yang, Bo-Ting Liao
Life of this patent
Estimating the term…
Abstract
The invention relates to a hybrid optical switch, which is composed of a silicon micro-mirror-array and a mini-actuator array mainly. The invention which combines microelectromechanical systems technology and traditional precision machining technology, possesses the advantages of low cost, high accuracy, high fabrication yield, low actuation voltage, low power consumption, self-aligned micro-mirrors, and easy fiber alignment.
Claims12
A hybrid optical switch apparatus, comprising:
- a silicon micro-mirror array;
- a silicon micro-mirror-array holder;
- an alignment stage;
- a collimator array;
- a collimator platform;
- an actuator array;
- a housing;
- a collimator platform support;
- and
- a collimator stage;
- wherein the silicon micro-mirror array being held by the silicon micro-mirror-array holder, the silicon micro-mirror-array holder being fixed on the alignment stage, the mini-actuator array being installed underneath the silicon micro-mirror array, the collimator being mounted on the collimator platform, the collimator platform being supported by the collimator platform support, the collimator platform support being fixed on the collimator stage, and the housing is used to contain the components to form the hybrid optical switch apparatus.
An actuator apparatus having a mirror, comprising:
- an electromagnetic bi-stable relay;
- a L-shape arm;
- a cantilever;
- and
- a silicon micro-mirror;
- wherein the silicon micro-mirror and the cantilever lies above the electromagnetic bi-stable relay, the L-shape arm glued on the electromagnetic bi-stable relay, the cantilever and the L-shape arm is separated to form the actuator.
A method for fabricating a silicon micro-mirror array of a hybrid optical switch apparatus, comprising:
- providing a silicon wafer;
- depositing a silicon nitride layer on the silicon wafer;
- conducting a reactive ion etching on the both sides of the silicon wafer;
- conducting a wet etching process on the silicon wafer;
- removing the residual silicon nitride layer by an acid;
- and
- sputtering a metal layer on the silicon wafer to form the silicon micro-mirror array of the hybrid optical switch.
Dependencies are inferred from the claim text.