Reverse x-ray photoelectron holography device and its measuring method
OwnerKoichi Hayashi, Eiichiro Matsubara +1inventors
InventorsKoichi Hayashi, Eiichiro Matsubara, Tomohiro Matsushita
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OwnerKoichi Hayashi, Eiichiro Matsubara +1inventors
InventorsKoichi Hayashi, Eiichiro Matsubara, Tomohiro Matsushita
Estimating the term…
[Problems] To provide a reverse X-ray photoelectron holography device, in which energy control and convergence are facilitated and a hologram of good contrast is obtained; and to provide its measuring method. [Means for Solving Problems] A Reverse X-ray photoelectron holography measuring method where a measurement sample is irradiated with an electron beans, incident angle and rotation angle of the electron beam are varied by varying the posture of the measurement sample to the electron beam, and a variation in intensity of characteristic X-ray emitted when the measurement sample is excited is recorded as the atomic resolution hologram around the atom of a specific element, wherein, when the intensity is detected as the characteristic X-ray of the atom of the measurement sample, an object wave is generated as an electron wave scattered by the reference wave and the proximity atom in a holography where electrons incident to the measurement sample reach an atom generating specific X-ray as an electron wave, and an interference pattern is formed by compounding the reference wave with the object wave, thus monitoring the intensity of an electron beam.
A inverse X-ray photoelectron holography device, characterized in having:
A inverse X-ray photoelectron holography measurement method comprising:
A inverse X-ray photoelectron holography measurement method, comprising:
Dependencies are inferred from the claim text.