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AssigneeCymer, Inc.
InventorsWilliam N. Partlo, Alexander I. Ershov, German Rylov, Igor V. Fomenkov, Daniel J.W. Brown, Christian J. Wittak, Rajasekhar M. Rao, Robert A. Bergstedt, John Fitzgerald, Richard L. Sandstrom, Vladimir B. Fleurov, Robert N. Jacques, Ed Danielewicz, Robin Swain, Edmond Arriola, Mike Wyatt, Walter Crosby
Estimating the term…
An apparatus and method are disclosed which may comprise a pulsed gas discharge laser lithography light source which may comprise a seed laser portion providing a seed laser output light beam of seed pulses; an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses; the amplifier portion may comprise a ring power amplifier comprising amplifier portion injection optics comprising at least one beam expanding prism, a beam reverser and an input/output coupler; the beam expansion optics and the output coupler may be mounted on an optics assembly with the beam expansion optics rigidly mounted with respect to the optics assembly and the input/output coupler mounted for relative movement with respect to the optics assembly for optical alignment purposes.
An apparatus comprising:
Dependencies are inferred from the claim text.