Evaluation method and exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorsShu Watanabe, Masato Hagiri
Life of this patent
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Abstract
An exposure apparatus includes an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of a projection optical system, a first drive mechanism configured to drive the original stage in a first direction that is a scan direction, and a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
Claims8
An exposure apparatus comprising:
- a projection optical system configured to project an image of a pattern of an original onto a substrate;
- an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of the projection optical system;
- a first drive mechanism configured to drive the original stage in a first direction that is a scan direction;
- and
- a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
An evaluation method configured to evaluate an optical performance of a projection optical system in an exposure apparatus configured to project an image of an exposure pattern of an exposure original onto a substrate using the projection optical system, to move the exposure original and the substrate in a scan direction, and to expose the substrate, said evaluation method comprising:
- moving, in a direction orthogonal to the scan direction, an evaluation original having an evaluation pattern used to evaluate the optical performance of the projection optical system;
- projecting an image of the evaluation pattern via the projection optical system,
- wherein a width of the evaluation original in the direction orthogonal to the scan direction is smaller than that of the exposure original in the direction orthogonal to the scan direction.
A device manufacturing method comprising:
- exposing a substrate using an exposure apparatus;
- and
- developing the substrate that has been exposed,
- wherein the exposure apparatus includes:
- a projection optical system configured to project an image of a pattern of an original onto a substrate;
- an original stage mounted with an exposure original having a pattern used for exposure, and an evaluation original having a pattern used to evaluate an optical performance of the projection optical system;
- a first drive mechanism configured to drive the original stage in a first direction that is a scan direction;
- and
- a second drive mechanism configured to drive the evaluation original on the original stage in a second direction orthogonal to the first direction, a width of the evaluation original in the second direction is smaller than that of the exposure original in the second direction.
Dependencies are inferred from the claim text.