Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsKoen Jacobus Johannes Maria ZAAL, Joost Jeroen Ottens
Life of this patent
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Abstract
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
Claims15
-13. (canceled)
A lithographic apparatus, comprising:
- a substrate table arranged to support a substrate;
- a projection system configured to project a modulated radiation beam onto a substrate;
- a liquid supply system configured to provide a liquid in a region between the projection system and a substrate during exposure;
- a cover plate, physically separate from the substrate table, positioned radially outside of the substrate during exposure, and configured to provide a surface facing the projection system that is substantially adjacent to and level with the substrate;
- and
- a thermal insulator arranged to reduce heat transfer between the cover plate and the substrate table in order to provide thermal shielding of the substrate table by the cover plate.
A device manufacturing method, comprising:
- projecting a modulated radiation beam, through a liquid, onto a substrate held on a substrate table;
- and
- thermally insulating the a cover plate so as to reduce heat transfer between the cover plate and the substrate table and thereby enable thermal shielding of the substrate table by the cover plate, the cover plate physically separate from the substrate table, radially outside of the substrate during projection of the modulated radiation beam and having a surface that is substantially adjacent and level with the substrate.
A lithographic apparatus, comprising:
- a substrate table arranged to support a substrate;
- a projection system configured to project a modulated radiation beam onto a substrate;
- a measuring system configured to determine a position of a portion of the substrate table;
- a substrate table distortion determining device arranged to provide data regarding a distortion of the substrate table;
- and
- a substrate position controller configured to control the position of the substrate relative to the projection system by reference to the position of a portion of the substrate table measured by the measuring system and data regarding a distortion of the substrate table provided by the substrate table distortion determining device.
A device manufacturing method, comprising:
- projecting a modulated radiation beam onto a substrate held by a substrate table;
- determining a position of a portion of the substrate table;
- and
- controlling the position of the substrate relative to a projection system used to project the modulated radiation beam by reference to the determined position of the portion of the substrate table and data regarding a distortion of the substrate table.
A method of mapping a surface profile of a substrate table reflector in a lithographic apparatus, comprising:
- providing a first substantially planar reflector mounted on a first lateral side of a substrate table configured to support a substrate, the first reflector having a normal parallel to a first axis;
- providing a second substantially planar reflector mounted on a second lateral side of the substrate table, the second reflector having a normal parallel to a second axis non-parallel with respect to the first axis;
- and
- moving the substrate table parallel to the first axis while measuring a perpendicular distance from a surface of the second reflector to a reference point in a reference frame.
A device manufacturing method, comprising:
- mapping a surface profile of a reflector of a substrate table by moving the substrate table parallel to a first axis while measuring, in a direction substantially parallel to a second axis, a distance from a surface of the reflector to a reference point, the second axis being substantially orthogonal to the first axis;
- projecting a modulated radiation beam onto a substrate;
- and
- moving the substrate relative to a projection system used to project the modulated radiation beam in order to expose different target regions of the substrate, the movement controlled by reference to a position of the substrate, the position being determined by reference to a measurement of the separation of the substrate table reflector from a reference point and the surface profile of the substrate table reflector.
Dependencies are inferred from the claim text.