Liquid crystal display device and method for manufacturing the same

A liquid crystal display device comprising:

• a thin film transistor formed on a first substrate;
• a passivation layer formed on the first substrate including the thin film transistor;
• a pixel electrode which passes through the passivation layer, is electrically connected to a part of the thin film transistor and has a lamination structure of transparent metal and opacity metal, wherein the transparent metal part has a width wider than that of the opacity metal part;
• and
• a second substrate corresponding to the first substrate, on which a color filter layer is formed.

A method for fabrication of a liquid crystal display device comprising:

• forming a thin film transistor on a first substrate;
• forming a first passivation layer on the first substrate including the thin film transistor;
• forming a color filter layer on the first passivation layer;
• forming a second passivation layer on the first substrate including the color filter layer;
• selectively removing the second and the first passivation layers to form a contact hole through which the thin film transistor is partially exposed;
• laminating a transparent metal substance and an opacity metal substance on the entire portion of the top surface of the first substrate including the contact hole in sequence;
• selectively removing the opacity metal and the transparent metal parts to form a pixel electrode which is electrically connected to a part of the thin film transistor through the contact hole;
• selectively removing the opacity metal part to expose an edge portion of the transparent metal part ;
• and
• forming a second substrate corresponding to the first substrate.

A method for fabrication of a liquid crystal display device comprising:

• forming a thin film transistor on a first substrate;
• forming a passivation layer on the first substrate including the thin film transistor;
• selectively removing the passivation layer to form a contact hole through which a part of the thin film transistor is exposed;
• sequentially laminating a transparent metal and an opacity metal on the entire portion of the top surface of the first substrate including the contact hole;
• selectively removing the opacity metal and the transparent metal to form a pixel electrode, which is electrically connected to a part of the thin film transistor through the contact hole, and a common electrode;
• and,
• selectively removing the opacity metal to expose an edge portion of the transparent metal;
• and
• forming a color filter layer on a second substrate corresponding to the first substrate.