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US 2010/0072402 A1Published application
Extraction electrode manipulator
AssigneeAxcelis Technologies, Inc.
InventorsShu Satoh, John Adamik, Manny Sieradzki
Life of this patent
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Abstract
An extraction electrode manipulator system, comprising an ion source, a suppression electrode and a ground electrode, wherein the two electrode are supported by coaxially arranged two water cooled support tubes. A high voltage insulator ring is located on the other end of the coaxial support tube system to act as a mechanical support of the inner tube and also as a high voltage vacuum feedthrough to prevent sputtering and coating of the insulating surface.
Claims13
An extraction electrode manipulator system, comprising:
- a suppression electrode;
- wherein the suppression electrode is supported by an inner support tube of a coaxially arranged support tube system;
- a ground electrode;
- wherein the ground electrode is supported by an outer support tube of the coaxially arranged support tube system;
- and
- a high voltage insulator ring;
- wherein the high voltage insulating ring is located on the far end of the coaxially arranged support tube system and acts as mechanical support of the coaxial support system and also as a high voltage vacuum feedthrough.
4 more elements
An ion implantation system, comprising:
- an ion beam source comprising an extraction electrode manipulator system;
- a suppression electrode;
- wherein the suppression electrode is supported by an inner support tube of coaxially arranged support tube system;
- a ground electrode;
- wherein the ground electrode is supported by an outer support tube of coaxially arranged support tube system;
- an high voltage insulator ring;
- and
- wherein the high voltage insulating standoff is located on the far end of coaxially arranged support tube system and acts as mechanical support of the coaxial support system and also as a high voltage vacuum feedthrough;
- a beam line assembly receives the ion beam from the source comprising;
- a mass analyzer that selectively passes selected ions;
- and
- an end station that receives the ion beam from the beam line assembly.
9 more elements
Dependencies are inferred from the claim text.