Method for depositing a thin layer and product thus obtained
AssigneeSaint-Gobain Glass France
InventorsNicolas Nadaud, Andriy Kharchenko, Ulrich Billert, Rene Gy
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Abstract
One subject of the invention is a process for the treatment of at least one thin continuous film deposited on a first side of a substrate, characterized in that said at least one thin film is raised to a temperature of at least 300° C. while maintaining a temperature not exceeding 150° C. on the opposite side of said substrate to said first side, so as to increase the degree of crystallization of said thin film while keeping it continuous and without a step of melting said thin film. Another subject of the invention is the material that can be obtained by this process.
Claims23
A process for the treatment of at least one thin continuous film deposited on a first side of a substrate, wherein at every point on said at least one thin film that is heated to a temperature of at least 300° C., the temperature at no point on the opposite side of said substrate to said first side exceeding 150° C., thereby increasing the degree of crystallization of said thin film while keeping it continuous and without melting said thin film.
(canceled)
Dependencies are inferred from the claim text.