Detector for the detection of chemical warfare agents and method of manufacture thereof
AssigneeEADS Deutschland GmbH
InventorsMartin Eickhoff, Andreas Helwig, José Antonio Garrido, Gerhard Mueller
Life of this patent
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Abstract
In a method and apparatus for detecting toxic chemical hazardous materials and warfare agents in a gas, the gas is exposed to a substrate with a hydrogen terminated surface. The substrate may be made from a nonconductor material with available surface conductivity, or from a semiconductor material. The electrical resistance at the hydrogen terminated surface is measured to detect the presence of the hazardous materials and warfare agents. A method of producing such a substrate detector is also disclosed.
Claims26
-22. (canceled)
A method for selectively detecting highly toxic chemical hazardous materials and warfare agents in a gas, said method comprising:
- exposing the gas to a substrate with a hydrogen (H)-terminated surface;
- wherein, the substrate comprises one of a nonconductor material with available surface conductivity, and a semiconductor material.
A warfare agent detector for detecting toxic chemical hazardous materials or warfare agents in a gas, said detector comprising:
- a substrate which has a hydrogen (H)-terminated substrate surface for exposure to the gas;
- and
- a measuring device for measuring displacements of surface charges at the hydrogen (H)-terminated substrate surface;
- wherein, the substrate is made from one of a nonconductor material with surface conductivity, and a semiconductor material.
A process for producing a warfare agent detector for detecting toxic chemical hazardous materials or warfare agents in a gas, said detector comprising a substrate which has a hydrogen (H)-terminated substrate surface for exposure to the gas;
- and a measuring device for measuring displacements of surface charges at the hydrogen (H)-terminated substrate surface;
- wherein, the substrate is made from one of a nonconductor material with surface conductivity, and a semiconductor material, said process comprising:
- surface hydrogenating a substrate with the aid of a hydrogen plasma;
- and
- connecting said substrate to a measuring device for readout of a displacement of surface charge.
Dependencies are inferred from the claim text.