Stencil, Stencil Design System and Method for Cell Projection Particle Beam Lithography
AssigneeD2S, Inc.
InventorsAkira Fujimura, Takashi Mitsuhashi, Katsuo Komuro
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Abstract
Stencil masks, particle beam lithography characters and methods for designing the same for use in particle beam lithography are disclosed. The masks, characters and methods for designing them allows for more accurately writing images by reducing various chemical and physical effects, particularly Coulomb and proximity effects. Particle current reaching a surface is reduced by introducing shield areas, which preserve the shape and fidelity of the written image. The shape of the written image is further corrected by systematically adjusting the shape of the character or mask.
Claims36
A stencil mask for particle beam lithography comprising:
- an aperture area defining a perimeter of a desired image shape, wherein said aperture area comprises a plurality of open areas;
- and
- a shield area comprising an interstitial area between said plurality of open areas.
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A character for projecting a desired image onto a surface using a charged particle beam, the character being located in a stencil mask, the character comprising:
- a shape to approximately achieve said desired image, said shape having one or more blocking members, wherein said blocking members reduce charged particle beam current passing through said shape while permitting sufficient charged particle beam current through said shape to project said desired image onto said surface, thereby reducing Coulomb and proximity effects.
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A method of direct writing a desired image on a surface using a charged particle beam, the method comprising:
- providing a character in a stencil mask, the character having a shape to approximately achieve said desired image, said shape having one or more blocking members, wherein said blocking members reduce particle beam current passing through said shape;
- passing said charged particle beam through said shape, wherein said blocking members partially block current from said charged particle beam while permitting sufficient beam current through said shape to project said desired image onto said surface.
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A method for designing a stencil mask for particle beam lithography comprising:
- a. loading a character shape, wherein a perimeter of said shape defines an outline for a desired pattern;
- b. determining shielding members;
- c. generating a modified character shape using said shielding members, wherein the shielding members are capable of blocking radiation from passing through said modified character shape;
- and
- d. repeating steps a-c as necessary to generate a sufficient number of modified character shapes to create said stencil mask.
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Dependencies are inferred from the claim text.