Method for Repairing Display Device and Apparatus for Same
AssigneesJapan Display Inc., Panasonic Liquid Crystal Display Co., Ltd.
InventorsTakeshi ARAI, Nobuaki NAKASU, Tadao EDAMURA, Noriyuki OROKU
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Abstract
An object of the present invention is to provide a method for repairing a display device according to which a wide variety of regions can be repaired in various ways using various materials, as well as an apparatus for the same. The present invention provides a repairing apparatus for repairing a pattern defect on a surface of a substrate in a display device where an electronic circuit pattern having the above described pattern defect is formed, characterized by having a plasma irradiation means for repairing the above described pattern defect through local irradiation of a region including the above described pattern defect with plasma.
Claims26
An apparatus for repairing a display device having a pattern defect on a surface of a substrate where an electronic circuit pattern having said pattern defect is formed, characterized by comprising
- a plasma irradiation means for repairing said pattern defect through local irradiation of a region including said pattern defect with plasma.
A method for repairing a display device having a pattern defect on a surface of a substrate where an electronic circuit pattern having said pattern defect is formed, characterized in that
- said pattern defect is repaired through local irradiation of a region including said pattern defect with plasma.
A method for repairing a display device, characterized in that
- plasma is generated by applying high-frequency power to an inert gas supplied into a tubule for generating plasma from one end of said tubule,
- the plasma jet is finely pointed as a result of a mask provided between the other end of said tubule for generating plasma and the substrate, and
- a reactive gas supplied from a second gas supplying portion decomposes in accordance with the physical amount of the gas supplied from a first gas supplying portion so that a pattern defect in an electronic circuit pattern on said substrate can be repaired.
A film forming or surface processing apparatus having a local gas sucking and discharging mechanism, characterized in that
- said local gas sucking and discharging mechanism comprises:
- an upper lid;
- an inner wall surrounding the center of said upper lid provided on the bottom of said upper lid in the direction of a substrate on which a film is formed or a surface process is carried out;
- and an outer wall surrounding said inner wall provided on the bottom of said upper lid in the direction of said substrate, and has
- a structure where a gas is introduced into a first space inside said inner wall and a gas is discharged from a second space between said inner wall and said outer wall, wherein
- at least said inner wall or said outer wall has a labyrinth structure on the open side.
A film forming or surface processing apparatus having a local gas sucking and discharging mechanism, characterized in that
- said local gas sucking and discharging mechanism comprises:
- an upper lid;
- an inner wall surrounding the center of said upper lid provided on the bottom of said upper lid in the direction of a substrate on which a film is formed or a surface process is carried out;
- a middle wall surrounding said inner wall provided on the bottom of said upper lid in the direction of said substrate;
- and an outer wall surrounding said middle wall provided on the bottom of said upper lid in the direction of said substrate, and has
- a structure where a gas is introduced into a first space inside said inner wall, a gas is discharged from a second space between said inner wall and said middle wall, and a gas is introduced into a third space between said middle wall and said outer wall, wherein
- at least one of said inner wall, said middle wall and said outer wall has a labyrinth structure on the open side.
Dependencies are inferred from the claim text.