Film-formation method, method for manufacturing electro-optical device, electro-optical device, and electronic apparatus

Abstract

A film-formation method is a method for depositing a liquid containing a film material to form a film in a prescribed film formation area enclosed by a partition wall on a substrate. The film-formation method includes forming the partition wall using at least in part a wettability-variable material in which wettability with respect to the liquid is variable, depositing the liquid in the film formation area, varying the wettability of the wettability-variable material in the partition wall in a state in which the liquid is disposed within the film formation area so that liquid affinity of the wettability-variable material becomes higher than liquid affinity of the wettability-variable material before the liquid is deposited in the film formation area, and forming the film by solidifying the film material in the liquid.

Dependencies are inferred from the claim text.