Apparatus and method for pattern inspection

A pattern inspection apparatus comprising:

• a pulsed light source configured to emit pulsed light;
• a stage configured to mount thereon an inspection target object with a pattern formed thereon;
• a time delay integration (TDI) sensor configured to detect, a plurality of times with a time delay, each pixel value of an optical image of the inspection target object, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and to integrate a detected each pixel value for each pixel of the optical image;
• a light quantity sensor configured to detect a light quantity of the pulsed light before emitting the pulsed light onto the inspection target object;
• a light quantity measurement circuit configured to input the light quantity detected by the light quantity sensor, and to measure a light quantity of each pulse while being synchronized with a period of the pulsed light;
• a correction unit configured to input the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and to correct the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse;
• and
• an inspection unit configured to inspect whether there is a defect of the pattern, using the integrated pixel value corrected.

A pattern inspection method comprising:

• emitting pulsed light;
• detecting, a plurality of times with a time delay, each pixel value of an optical image of an inspection target object with a pattern formed thereon, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and integrating a detected each pixel value for each pixel of the optical image, by using a time delay integration (TDI) sensor;
• detecting a light quantity of the pulsed light after emitting the pulsed light onto the inspection target object;
• inputting the light quantity detected and measuring a light quantity of each pulse while being synchronized with a period of the pulsed light;
• inputting the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and correcting the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse;
• and
• inspecting whether there is a defect of the pattern, using the integrated pixel value corrected.

A pattern inspection method comprising:

• emitting pulsed light;
• detecting, a plurality of times with a time delay, each pixel value of an optical image of an inspection target object with a pattern formed thereon, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and integrating a detected each pixel value for each pixel of the optical image, by using a time delay integration (TDI) sensor;
• detecting a light quantity of the pulsed light before emitting the pulsed light onto the inspection target object;
• inputting the light quantity detected and measuring a light quantity of each pulse while being synchronized with a period of the pulsed light;
• inputting the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and correcting the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse;
• and
• inspecting whether there is a defect of the pattern, using the integrated pixel value corrected.