Exposure apparatus and device fabrication method

A device fabrication method comprising:

• exposing a substrate using an exposure apparatus,
• wherein the exposure apparatus is a scanning exposure apparatus which sequentially transfers a pattern of a reticle to a plurality of shot regions on the substrate while synchronously moving the reticle and the substrate in a scanning direction and reversing the scanning direction, the exposure apparatus comprising:
• an obtaining unit configured to obtain a driving condition of a stage which holds the substrate, and shot information concerning an arrangement of the plurality of shot regions,
• a calculating unit configured to calculate, based on the driving condition and shot information obtained by the obtaining unit, a first time serving as a time required to drive the stage in a non-scanning direction perpendicular to the scanning direction, and a second time serving as a time required to drive the stage in the scanning direction, both of which range from when exposure of one of the plurality of shot regions ends until exposure of the next shot region starts, and
• an adjusting unit configured to adjust, when the first time calculated by the calculating unit is longer than the second time calculated by the calculating unit, one of a time for which an acceleration of the stage nonlinearly changes in the process of reversing the scanning direction, and a settling time taken for the stage to settle from when acceleration of the stage ends until exposure starts, so that the second time becomes longer than the first time in driving the stage in the scanning direction;
• and
• performing a development process for the substrate exposed.