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US 2010/0060758 A1Published application
Solid-state imaging device and method of producing solid-state imaging device
AssigneeSony Corporation
InventorsItaru Oshiyama, Yuki Miyanami, Susumu Hiyama, Kazuki Tanaka
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Abstract
A solid-state imaging device includes a sensor including an impurity diffusion layer provided in a surface layer of a semiconductor substrate; and an oxide insulating film containing carbon, the oxide insulating film being provided on the sensor.
Claims13
A solid-state imaging device comprising:
- a sensor including an impurity diffusion layer provided in a surface layer of a semiconductor substrate;
- and
- an oxide insulating film containing carbon, the oxide insulating film being provided on the sensor.
A method of producing a solid-state imaging device comprising the steps of:
- forming a sensor including an impurity diffusion layer in a surface layer of a semiconductor substrate;
- and
- depositing an oxide insulating film containing carbon on the sensor while controlling the carbon concentration by controlling a flow rate ratio of a material gas containing carbon and the deposition temperature.
Dependencies are inferred from the claim text.