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US 2010/0059672 A1Published application
Device and method for analyzing a sample
AssigneeCarl Zeiss NTS GmbH
InventorUlrike Zeile
Life of this patent
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Abstract
A device and method for analyzing a sample, in particular a sample which contains low-density materials, is provided. Ions of a predefined mass and/or a predefined elementary charge are selected from a plurality of ions. The selected ions are directed onto the sample for sample preparation. An electron beam is then directed onto the prepared sample and a spatial distribution of scattered electrons is measured.
Claims20
A method for analyzing a sample, comprising:
- generating first ions and second ions, the first ions having at least one of:
- a first predefinable mass and a first predefinable number of elementary charges, and the second ions having at least one of:
- a second predefinable mass and a second predefinable number of elementary charges, wherein the first ions are different from the second ions according to at least one of:
- (i) the second predefinable mass being different from the first predefinable mass, and (ii) the second predefinable number of elementary charges being different from the first predefinable number of elementary charges;
- generating an ion beam from the first ions and the second ions;
- selecting, as selected ions, the first ions or the second ions in the ion beam;
- directing the selected ions to the sample, at least a portion of the sample being prepared using the selected ions;
- generating an electron beam;
- directing the electron beam onto the prepared portion of the sample;
- detecting spatially distributed electrons scattered from the sample;
- and
- analyzing a spatial distribution of the scattered electrons.
9 more elements
A particle beam device for analyzing a sample, comprising:
- at least one ion generator that generates first ions and second ions, the first ions having at least one of:
- a first predefinable mass and a first predefinable number of elementary charges, and the second ions having at least one of:
- a second predefinable mass and a second predefinable number of elementary charges, wherein the first ions are different from the second ions according to at least one of:
- (i) the second predefinable mass being different from the first predefinable mass, and (ii) the second predefinable number of elementary charges being different from the first predefinable number of elementary charges;
- at least one ion beam generator that generates an ion beam from the first ions and the second ions;
- at least one ion selector that selects, as selected ions, the first ions or second ions in the ion beam;
- at least one ion director that directs the selected ions to the sample, at least a portion of the sample being prepared using the selected ions;
- at least one electron beam generator that generates an electron beam;
- at least one electron beam director that directs the electron beam onto the prepared portion of the sample;
- at least one detector that detects spatially distributed electrons scattered from the sample;
- and
- at least one analyzer that analyzes a spatial distribution of the scattered electrons.
9 more elements
Dependencies are inferred from the claim text.