Semiconductor processing

A method, comprising:

• receiving a semiconductor substrate in a semiconductor processing chamber;
• generating an electromagnetic energy and an electric field that is substantially uniform throughout the semiconductor processing chamber;
• and
• annealing the semiconductor substrate with the electromagnetic energy.

A method of generating electromagnetic energy comprising:

• receiving a non-uniform electromagnetic energy that propagates in a first propagation direction;
• guiding the non-uniform electromagnetic energy to propagate in a second propagation direction that is perpendicular to the first propagation direction, the electromagnetic energy having a non-uniform energy distribution as the electromagnetic energy propagates in the second propagation direction;
• and
• guiding the electromagnetic energy to propagate in a third propagation direction that is substantially perpendicular to the second propagation direction, the electromagnetic energy having a substantially uniform energy distribution as the electromagnetic energy propagates in the third propagation direction, the third propagation direction being substantially perpendicular to a surface of the semiconductor substrate.