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AssigneeFerrotec Corporation
InventorYuichi Shiina
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There is provided a plasma generating apparatus having a plasma gun which can remove droplets mixed with plasma efficiently without reducing the effective amount of plasma generated by vacuum arc discharge and in which a droplet removing portion can be constituted easily and inexpensively, and precision of surface treatment of films by high purity plasma can be enhanced. Periphery of a cathode (407) of said plasma gun is surrounded by an enclosure member (420) and a droplet removing device (406) constituted by laying a plurality of droplet collecting members (411) in multilayer is provided on the inside of the enclosure member (420). The enclosure member (420), the collecting member (411) and a plasma advancing path (402) have no relation connected with an arc power supply (409) and are held in an electrically neutral floating state.
In a plasma generating apparatus including a plasma generating portion by which a plasma is generated by a vacuum arc discharge occurred between a cathode and an anode under a vacuum atmosphere and a plasma advancing path in which said plasma generated by said plasma generating portion progresses to a plasma treating portion side, said plasma generating apparatus characterized in that an enclosure member surrounding the periphery of said cathode is arranged in said plasma generating portion, a collecting member catching cathode material particles (referred to as droplets) by-produced from said cathode at a plasma generating time is disposed on the inside of said enclosure member, and at least said collecting member and said enclosure member are held in an electrically neutral floating state.
Dependencies are inferred from the claim text.