Ultra Dark Polymer
AssigneeTexas Instruments Incorporated
InventorJason Michael Neidrich
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Abstract
A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.
Claims12
An antireflective coating comprising a dark polymer material overlying a reflective surface, wherein the reflectivity of the dark polymer material is enhanced by a roughening of a top surface of the dark polymer material.
5-15. (canceled)
An integrated circuit comprising:
- a substrate containing transistors and conductors, wherein the substrate is covered with an antireflective coating formed from a dark polymer matrix;
- and
- an array of light modulators formed on top of the substrate, the array of light modulators configured to modulate light based upon image data to display the image data on a display plane.
Dependencies are inferred from the claim text.