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US 2009/0291233 A1Published application
Process for producing gas barrier films
AssigneeFUJIFILM Corporation
InventorsToshiya TAKAHASHI, Tatsuya FUJINAMI
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Abstract
A process for producing gas barrier films comprises the steps of: applying a pressure of 50 N/m2 and above to a surface of a substrate; and subsequently forming a gas barrier layer on the surface of the substrate by plasma-enhanced CVD in a pressure atmosphere of 60 Pa and above.
Claims6
A process for producing gas barrier films comprising the steps of:
- applying a pressure of 50 N/m2 and above to a surface of a substrate;
- and
- subsequently forming a gas barrier layer on the surface of the substrate by plasma-enhanced CVD in a pressure atmosphere of 60 Pa and above.
Dependencies are inferred from the claim text.