Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device

A far ultraviolet light source device which generates extreme ultra violet by irradiating laser radiation upon a target material and converting it to plasma, comprising:

• a first chamber to which a first exhaust pump is provided;
• a second chamber, connected to said first chamber, and to which a second exhaust pump is provided;
• a target material supply means which supplies said target material to within said first chamber;
• a laser light source which, by irradiating laser radiation upon said target material, converts said target material into plasma so that it emits extreme ultra violet;
• a mirror for extreme ultra violet which collects said extreme ultra violet emitted from said plasma by reflecting it towards a focal point which is provided within said second chamber;
• a radiation shield means which is provided in the neighborhood of said focal point, having an aperture portion which allows the passage of said extreme ultra violet, while attenuating electromagnetic waves of wavelength other than that of said extreme ultra violet with portions other than said aperture portion;
• and
• an interception valve which either communicates or intercepts an outlet portion at which said extreme ultra violet collected at said focal point is outputted;
• and wherein said mirror for extreme ultra violet comprises:
• a substrate portion which is formed to be curved in at least one direction;
• a foundation portion formed from a first composite layer which is provided on one side of said substrate portion;
• and
• a reflecting portion made by forming grooves of predetermined shapes in a second composite layer which is integrally provided on the other side of said first composite layer from said substrate portion.