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US 2009/0263292 A1Published application
Method and apparatus for processing polysilazane film
AssigneeTokyo Electron Limited
InventorsShingo Hishiya, Kimiya Aoki, Masahisa Watanabe
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Abstract
A method of processing a polysilazane film includes a first heat process and a subsequent second heat process performed on a target substrate with a polysilazane coating film formed thereon. The first heat process is performed by supplying water vapor into a process area within a reaction container, which accommodates the target substrate, while setting the process area at a first temperature of from 390° C. to 410° C. The second heat process is performed by supplying water vapor into the process area, while setting the process area at a second temperature of from 600° C. to 800° C.
Claims12
An apparatus for processing a polysilazane film, comprising:
- a reaction container having a process area configured to accommodate a plurality of target substrates placed at intervals in a vertical direction, the target substrates being provided with a polysilazane coating film formed thereon;
- a heater configured to heat the process area;
- an exhaust system configured to exhaust the reaction container;
- a supply system configured to supply a process gas into the reaction container, the supply system comprising a portion configured to supply water vapor into the reaction container;
- and
- a controller configured to control an operation of the apparatus,
- wherein the controller is present to execute a first heat process, a second heat process, and a third heat process sequentially applied onto the polysilazane coating film in this order;
- the first heat process being formed while supplying water vapor into the process area, while setting the process area and setting the process area at a first temperature of from 390° C. to 410° C.;
- the second heat process being formed while supplying water vapor into the process area and setting the process area at a second temperature of from 600° C. to 800° C.;
- and
- the third heat process being performed while setting the process area at a third temperature of from 800° C. to 1000° C.,
- wherein the first and second heat process are directly connected to each other by a first heating-up period and the second and third heat processes are directly connected to each other by a second heating-up period such that each of the first and second heating-up period is arranged to increase temperature of the process area with time without a temperature decrease halfway therethrough, and
- the process area is kept vacuum-exhausted to a vacuum pressure of from 133 to 93,100 Pa over the first, second, and third heat processes.
10 more elements
An apparatus for processing a polysilazane film, comprising:
- a reaction container having a process area configured to accommodate a target substrate with a polysilazane coating film formed thereon;
- a heater configured to heat the process area;
- an exhaust system configured to exhaust the reaction container;
- a supply system configured to supply a process gas into the reaction container, the supply system comprising a portion configured to supply water vapor into the reaction container;
- and
- a controller configured to control an operation of the apparatus,
- wherein the controller is preset to execute a first heat process, a second heat process, and a third heat process sequentially applied onto the polysilazane coating film in this order;
- the first heat process being performed for 5 to 60 minutes while supplying water vapor into the process area, setting the process area at a first temperature of from 390° C. to 410° C., and vacuum-exhausting the process area to a vacuum pressure of from 133 to 93,100 Pa;
- the second heat process being performed for 5 to 60 minutes while supplying water vapor into the process area, setting the process area at a second temperature of from 600° C. to 800° C., and vacuum-exhausting the process area to a vacuum pressure of from 133 to 93,100 Pa, and
- the third heat process being performed for 5 to 60 minutes while setting the process area at a third temperature of from 800° C. to 1000° C. and vacuum-exhausting the process area to a vacuum pressure of from 133 to 93,100 Pa,
- wherein the first and second heat processes are directly connected to each other by a first heating-up period and the second and third heat processes are directly connected to each other by a second heating-up period such that each of the first and second heating-up period is arranged to increase temperature of the process area with time without a temperature decrease halfway therethrough.
8 more elements
Dependencies are inferred from the claim text.