# US 2009/0260983 A1 · Cylindrical Magnetron > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2009/0260983 A1 - Document ID: US20090260983A1 - Status: Published application - Kind: A1 - Application number: 12/420,935 - Filed: 2009-04-09 - Published: 2009-10-22 - Earliest claimed: 2008-04-14 - Assignees: Angstrom Sciences, Inc. - Inventors: Mark A. Bernick - Web page: https://patentgrep.com/patent/US20090260983A1 ## CPC - C23C 14/3407: {Cathode assembly for sputtering apparatus, e.g. Target} - H01J 37/3405: {Magnetron sputtering} - H01J 37/3435: {Target holders (includes backing plates and endblocks)} - Y10T 29/49826: Assembling or joining - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ## Abstract A rotatable cylindrical magnetron sputtering device that includes a cathode body defining a magnet receiving chamber and a cylindrical target assembly surrounding the cathode body, wherein the cylindrical target assembly is rotatable around the cathode body. The cylindrical target assembly includes a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel portion so as to create a space gap between the hollow mandrel and the target portion, wherein the space gap may be greater than 0.002 inch and less than 0.020 inch. ## Claims ### Claim 1 A cylindrical target assembly for use in a rotatable cylindrical magnetron sputtering device, the assembly comprising: a hollow mandrel; and a target portion mounted around and spaced away from the hollow mandrel wherein a space gap is defined between the hollow mandrel and the target portion. ### Claim 2 (depends on 1) The assembly of claim 1 wherein the space gap is greater than 0.002 inch and less than 0.020 inches. ### Claim 3 (depends on 1) The assembly of claim 1, wherein the hollow mandrel includes an aluminum portion and wherein the target portion includes a ceramic portion. ### Claim 4 (depends on 3) The assembly of claim 3, wherein the aluminum portion is a backing tube and wherein the ceramic portion is selected from the group consisting of an indium tin oxide target and an aluminum zinc oxide target. ### Claim 5 (depends on 4) The assembly of claim 4, wherein the backing tube comprises aluminum, stainless steel, copper or titanium. ### Claim 6 (depends on 1) The assembly of claim 1, wherein the target portion is adapted to be rotatable with the hollow mandrel. ### Claim 7 (depends on 1) The assembly of claim 1, wherein the hollow mandrel and the target portion are cylindrical in shape. ### Claim 8 (depends on 7) The assembly of claim 7, wherein the hollow mandrel comprises a reduced diameter portion and an enlarged diameter portion thereby forming a shoulder therebetween, and wherein the target portion is mounted around the reduced diameter portion of the hollow mandrel. ### Claim 9 (depends on 8) The assembly of claim 8, wherein the target portion has an inner diameter and the reduced diameter portion of the hollow mandrel has an outer diameter; and wherein the inner diameter of the target portion is greater than the outer diameter of the reduced diameter portion of the hollow mandrel so as to create the space gap between the inner diameter of the target portion and the outer diameter of the reduced diameter portion of the hollow mandrel. ### Claim 10 (depends on 8) The assembly of claim 8, wherein the target portion has a first end and a second end, the second end abuts against the shoulder when the target portion is mounted around the reduced diameter portion of the hollow mandrel, and wherein the target portion is retained for rotation with the hollow mandrel via a retaining assembly located at the first end of the target portion. ### Claim 11 (depends on 10) The assembly of claim 10, wherein the retaining assembly is adapted to exert a biasing force against the first end of the target portion such that the second end of the target portion is forced against the shoulder of the hollow mandrel. ### Claim 12 (depends on 10) The assembly of claim 10, wherein the retaining assembly is comprised of: a compression ring positioned around the hollow mandrel at a first end of the hollow mandrel and in contact with the second end of the target portion; a plurality of biasing members arranged around the circumference of the hollow mandrel at the second end of the target portion and abutting the compression ring; a spacing ring positioned around the circumference of the hollow mandrel and abutting the plurality of biasing members; and a clamp abutting the spacing ring and positioned on the first end of the target portion of the cylindrical target assembly. ### Claim 13 (depends on 12) The assembly of claim 12, wherein the plurality of biasing members comprises compression springs or wave springs. ### Claim 14 A rotatable cylindrical magnetron sputtering device comprising: a cathode body defining a magnet receiving chamber, wherein a magnet arrangement is received with the magnet receiving chamber; a cylindrical target assembly surrounding the cathode body, the cylindrical target assembly comprises a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel wherein a space gap is defined between the hollow mandrel and the target portion; and a drive assembly in communication with the cylindrical target assembly, wherein the cylindrical target assembly is rotatable around the cathode body. ### Claim 15 (depends on 14) The device of claim 14, wherein the space gap is greater than 0.002 inch and less than 0.020 inch. ### Claim 16 (depends on 14) The device of claim 14, wherein the hollow mandrel comprises an aluminum portion and wherein the target portion comprises a ceramic portion selected from the group consisting of an indium tin oxide target and an aluminum zinc oxide target. ### Claim 17 (depends on 16) The device of claim 16, wherein the ceramic portion of the cylindrical target assembly is adapted to be rotatable with the aluminum portion. ### Claim 18 (depends on 16) The device of claim 16, wherein the ceramic portion is secured to the cylindrical target assembly for rotation therewith via a retaining assembly. ### Claim 19 (depends on 18) The device of claim 18, wherein the retaining assembly is adapted to exert a biasing force against an end of the ceramic portion such that no gap exists between an opposite end of the ceramic portion and aluminum portion of the hollow mandrel. ### Claim 20 A process for enhancing the operation of a cylindrical target assembly, the steps comprising: providing the cylindrical target assembly for rotation around a cathode body, wherein the cylindrical target assembly comprises a hollow mandrel and a target portion; mounting the target portion around a portion of the hollow mandrel, wherein the target portion is spaced away from the hollow mandrel so as to create a space gap between the hollow mandrel and the target portion; and securing the target portion of the cylindrical target assembly onto the hollow mandrel such that the target portion rotates with the hollow mandrel. ### Claim 21 (depends on 20) The process of claim 20, wherein the target portion is secured to the cylindrical target assembly for rotation therewith via a retaining assembly. ### Claim 22 (depends on 20) The process of claim 20, wherein the space gap is greater than 0.002 inch and less than 0.020 inch. ### Claim 23 (depends on 20) The process of claim 20, wherein a portion of the hollow mandrel comprises aluminum, stainless steel, copper or titanium.