# US 2009/0260450 A1 · Method for measuring the creep of a thin film inserted between two rigid substrates, with one cantilever end

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- Number: US 2009/0260450 A1
- Document ID: US20090260450A1
- Status: Published application
- Kind: A1
- Application number: 12/314,746
- Filed: 2008-12-16
- Published: 2009-10-22
- Earliest claimed: 2007-12-20
- Assignees: Commissariat a l'Energie Atomique
- Inventors: Cecile Petitdidier; Raluca Tiron; Benedicte Mortini
- Web page: https://patentgrep.com/patent/US20090260450A1

## CPC

- G01N 3/20: by applying steady bending forces (G01N3/26, G01N3/28 take precedence)
- G01N 2203/0071: Creep
- G01N 2203/0094: Visco-elasticity
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)

## Abstract

A film is inserted between two rigid substrates which form a sample. The sample is fixed at a first end in a device for measuring creep. The device comprises means for applying a predetermined force on a free end of the sample. The film being sheared, study of its creep can be performed.

## Claims

### Claim 1

A method for measuring the viscoelastic properties of a film inserted between two rigid substrates forming a sample comprising a first end fixed in a measuring device, the method comprising:
applying a force on a predetermined area of the sample, wherein said force is applied on a free end of the sample,
measuring the creep of the film and
determining a characteristic temperature of said film.

### Claim 2 (depends on 1)

The method according to claim 1, comprising cantilevering of the fixed end of the sample by means of a clamp.

### Claim 3 (depends on 1)

The method according to claim 1 for studying the variations of the glass transition temperature versus the thickness of the thin film, comprising:
applying a predetermined force on the free end of the sample,
measuring the shear of the film,
determining the creep of the film from the shear measurement,
and determining the glass transition temperature.

### Claim 4 (depends on 1)

The method according to claim 1, wherein the film has a thickness comprised between 1 mm and 0.1 nm.

### Claim 5 (depends on 1)

The method according to claim 1, wherein the rigid substrates are made from silicon.

### Claim 6 (depends on 1)

The method according to claim 1, wherein the film is a lithographic resin.