Film thickness measuring apparatus and film thickness measuring method

A film thickness measuring apparatus for measuring a film thickness of a conductive film formed on a substrate, comprising:

• means for making a coil be opposed to a surface of the conductive film;
• means for making a magnetic field made to be induced in the coil by applying an alternating voltage to the coil operate on the conductive film;
• means for forming a state of making the magnetic field not to penetrate the film relatively and a state of making the magnetic field penetrate the film relatively, by making a frequency given to the coil sweep;
• and
• means for measuring a thin film constitution and various values of the film from a change part of an eddy current of the conductive film based on a skin effect corresponding to the frequency change of the alternating voltage.

A film thickness measuring apparatus for measuring a film thickness of a conductive film formed on a substrate, comprising:

• means for making a coil be opposed to a surface of the conductive film;
• means for making a magnetic field made to be induced in the coil by applying an alternating voltage to the coil operate on the conductive film;
• means for forming a state of making the magnetic field penetrate the film relatively from a state of making the magnetic field not penetrate the film relatively by changing a parameter influencing a skin effect and giving the parameter to the coil;
• and,
• means for lightening or eliminating an infiltration of the magnetic field into the film when detecting a change part in an eddy current by making the magnetic field penetrate the film relatively, and measuring a film constitution and various values of the film based on the change part of the eddy current.

A film thickness measuring apparatus for measuring a film thickness of a conductive film formed on a substrate, comprising:

• means for making a coil be opposed to a surface of the conductive film in a process of making a conductive film remove from or deposit on the substrate continuously;
• means for making the magnetic field made to be induced in the coil by an alternating current operate on the conductive film;
• means for forming a state of making the magnetic field not penetrate the film relatively and a state of making the magnetic field penetrate the film relatively, by changing a parameter influencing a skin effect of the conductive film and giving the parameter to the coil;
• and
• means for measuring a film constitution and various values of the film by measuring a remaining film thickness of the conductive film, a removed film thickness, and those change amount, and a change speed, from a change of an eddy current induced based on the change of state and from variations of various values corresponding to the eddy current.

A film thickness measuring apparatus for measuring a film thickness of a conductive film formed on a substrate, comprising:

• holding means for holding a conductive substrate having a conductive film;
• a coil made to be opposed to the conductive substrate with a certain distance separated;
• a condenser connected to the coil in parallel;
• a transmitter for giving a signal to a resonant circuit formed by the coil and the condenser;
• frequency counting means for calculating for a resonance frequency of the resonant circuit;
• parameter changing means for giving the coil an alternating current of high frequency, making a magnetic field made to be induced in the coil operate on the conductive film, and changing a parameter influencing a skin effect of the conductive film;
• and
• measuring means for forming a state of making the magnetic field not penetrate the film relatively and a state of making the magnetic field penetrate the film relatively, and measuring a variation of an eddy current induced by the change of state based on the skin effect or variations of various values corresponding to the eddy current induced,
• wherein a film thickness constitution and various values of the film formed on the substrate are measured.