Target for efficient use of precious deposition material

A method for producing a deposition target, comprising:

• providing a carrier formed of a first material and having a first surface;
• defining a cavity in the first surface, the cavity being deeper where a magnetic field intensity is expected to be greater during usage of the target in a deposition process;
• and
• pressing a second material, more precious than the first material, into the cavity so that the second material can be sputtered from the carrier when using the target during a deposition process while the first material is substantially unsputtered.

A plasma deposition configuration comprising:

• a substrate having a first surface upon which particles of a precious deposition material are to be deposited;
• a target having a generally planar second surface of the deposition material, the target comprising a carrier supporting the deposition material with a surface formed to include a trench following the plane of the second surface, the carrier formed of a material less precious than the deposition material;
• a magnetron apparatus to establish a magnetic field in a pattern for urging ions and electrons into proximity of the second surface, a strength of the magnetic field varying from a low strength proximate a central portion of the second surface, increasing and then decreasing near a periphery of the second surface,
• wherein the trench in the carrier and the magnetic field pattern are co-established so that a deepest portion of the trench is generally co-extensive with a highest intensity region of the field pattern.