Method of producing display device, display device, method of producing thin-film transistor substrate, and thin-film transistor substrate
AssigneeSony Corporation
InventorsHiroshi Sagawa, Naobumi Toyomura
Life of this patent
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AssigneeSony Corporation
InventorsHiroshi Sagawa, Naobumi Toyomura
Estimating the term…
A method of producing a display device includes the steps of forming gate electrodes on a substrate so that an arrangement of a source and a drain, in a pixel row direction, of a thin-film transistor formed in each of pixels on the substrate is reversed every pixel row; forming a gate insulating film and an amorphous semiconductor thin film on the substrate in that order so as to cover the gate electrodes; crystallizing the semiconductor thin film by irradiating the semiconductor thin film with an energy beam so that a scanning direction of the energy beam is the same with respect to the arrangement of the source and the drain in the pixel row direction; and forming a light-emitting element connected to the thin-film transistor.
A method of producing a display device comprising the steps of:
A display device comprising:
A display device comprising:
A method of producing a thin-film transistor substrate comprising the steps of:
A thin-film transistor substrate comprising:
Dependencies are inferred from the claim text.